Publication detail

Design of Setup for Laser Induced Plasma Etching

Lukáš Šilhan, Jan Novotný, Tomáš Plichta, Jan Ježek, Ondřej Vaculík, Mojmír Šerý

Original Title

Design of Setup for Laser Induced Plasma Etching

Type

conference paper

Language

English

Original Abstract

Plasma etching introduces a physically activated chemical process highly utilized in the semiconductor industry. However, for the creation of etched structures mask has to be prepared on top of the etched surfaces. This is usually achieved by electron beam lithography, which adds to the complexity and financial demands of the overall process. We present the design of a setup for maskless plasma etching, which utilizes a tightly focused ultrashort laser pulse for the ignition of etching plasma in a custom vacuum chamber with a connection to a gas-containing etching species. In addition, etched structures are written into the surface of sample by scanning with the vacuum chamber with relation to fixed laser focus. This enables maskless 3D etching of samples with a less complicated technological process.

Keywords

vacuum chamber, plasma etching, femtosecond laser, micromachining

Authors

Lukáš Šilhan, Jan Novotný, Tomáš Plichta, Jan Ježek, Ondřej Vaculík, Mojmír Šerý

Released

30. 10. 2024

Publisher

IEEE

Location

Brno, Czech Republic

ISBN

979-8-3503-7976-1

Pages count

2

URL

https://ieeexplore.ieee.org/document/10652276

BibTex

@inproceedings{BUT197205,
  author="Lukáš {Šilhan} and Ondřej {Vaculík}",
  title="Design of Setup for Laser Induced Plasma Etching",
  year="2024",
  pages="2",
  publisher="IEEE",
  address="Brno, Czech Republic",
  doi="10.1109/IVNC63480.2024.10652276",
  isbn="979-8-3503-7976-1",
  url="https://ieeexplore.ieee.org/document/10652276"
}

Responsibility: Ing. Marek Strakoš